Plasma (Etching)

This site is devoted to plasma processing (etching) in semiconductor manufacturing. Actually you can find the following items on this site:

An unfinished tutorial on low temperature plasma processing in html or pdf.
A paper on PFC emission reduction during tungsten etchback process from the SPIE conference in Edinburgh (May 2001), see the publications page.
Several presentations discussing some aspects of process monitoring and FDC ( fault detection and classification) for a via etch process, see the publications page.
A paper on using older gate etch equipment on newer technologies from a GMM Workshop November, 2005, Fraunhofer IISB, Erlangen. Probably you can find the presentation here.

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