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Bibliography

1
Brian Chapmann.
Glow Discharge Processes.
John Wiley & Sons Inc., 1980.

2
Francis F. Chen.
Plasma Physics and Controlled Fusion.
Plenum Press, second edition, 1984.

3
Gerhard Franz.
Oberflächentechnologie mit Niederdruckplasmen.
Springer-Verlag, second edition, 1994.
in German.

4
W. N. G. Hitchon.
Plasma Processes for Semiconductor Fabrication.
Cambridge University Press, 1999.

5
M. A. Lieberman and A. J. Lichtenberg.
Principles of Plasma Discharges and Materials Processing.
John Wiley & Sons Inc., 1994.

6
Oleg A. Popov, editor.
High Density Plasma Sources.
Noyes Publications, Park Ridge, NJ, 1995.

7
Minoru Sugawara, editor.
Plasma Etching Fundamentals and Applications.
Oxford University Press, 1998.



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