Contents

• Contents
• Introduction
  • General Aspects of the IC Manufacturing Process
  • Glow Discharges in Inert and Reactive Gases
    • Gases and Ideal Gases
    • Atomic and Molecular Collisions
    • Vacuum Technology
    • Electron and Ion Mobility
  • Basic Concepts and Terminology in Plasma Etching
  • Interactions between Plasma, Substrate and Etching Equipment
  • Commonly used Plasma Sources
    • Capacitive Discharges
    • Inductive Discharges
    • Wave Heated Discharges
  • Typical Etch Processes in Submicron CMOS Technology
    • Photo Resist Stripping
  • Basic Concepts of Plasma assisted Deposition
  • Plasma Damage
    • Gate Oxide Breakdown and Wear-Out
    • Plasma Non-Uniformity
    • Topography related Effects
    • UV Radiation
    • Damage Measurements
• Glossary
• Bibliography
• Index
• About this document ...